Chaoying Gu is a Ph.D. student in Electrical Engineering & Computer Sciences at UC Berkeley working under the supervision of Prof. Laura Waller. She began her graduate studies in 2022 after graduating with a B.S. in Electrical Engineering from the Peking University, P.R. China. Her research focuses on adapting novel computational imaging techniques from the optical to the EUV regime. She has expertise in signal processing, optimization algorithms, and their applications in image reconstruction and aberration characterization.
Research
Chaoying’s research focuses on computational imaging techniques, specifically Fourier Ptychographic Microscopy (FPM), to address the challenges of Extreme Ultraviolet (EUV) mask imaging. Her work aims to improve resolution and phase sensitivity, crucial for next-generation lithography. By leveraging FPM at the 13.5 nm EUV wavelength, she corrects spatially varying aberrations to extend the usable field of view and enhance reconstruction accuracy. Her research includes the development and evaluation of algorithms to handle complex structures, such as elliptical pupils and attenuated phase shift masks, using experimental data from the SHARP EUV microscope at Lawrence Berkeley National Laboratory.
