Michael Hoffmann obtained his B.Sc. in Electrical Engineering and Information Technology from Otto-von-Guericke University, Magdeburg, Germany in 2013. Subsequently, he received his M.Sc. and Ph.D. in Electrical Engineering from TU Dresden, Germany in 2016 and 2020, respectively. After visiting UC Berkeley as a student researcher in 2016, he worked as a Scientist at NaMLab gGmbH in Dresden, Germany. Since 2021, he is a postdoctoral scholar with the Department of Electrical Engineering and Computer Sciences at UC Berkeley.
Research
My research is focused on nanoelectronic materials and devices for energy-efficient information processing as well as energy conversion and storage applications. My interests include nanofabrication, device physics and the electrical and structural characterization of nanoscale materials and devices. In particular, my research has been focused on HfO2 and ZrO2 based ferroelectric thin films, which are promising for highly scaled, ultra-low power logic and memory devices. One major research topic for me is the investigation of ferroelectric thin films for applications in negative capacitance transistors, which could overcome the fundamental limits of energy-efficiency in electronics.
